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Study of impurity distribution in mechanically polished, chemically treated and high vacuum degassed pure Niobium samples using TOFSIMS technique

机译:机械抛光,化学杂质分布的研究   使用TOFsIms技术处理和高真空脱气的纯铌样品

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摘要

The performance of Superconducting radio frequency cavities (SRF) is stronglyinfluenced by various impurities within the penetration depth (~50nm) of Nb,which in turn depends on the applied surface treatments. The effect of thesesurface treatments on the impurities of Nb has been explored using varioussurface analytical treatments. But, the results are still inadequate in manyaspects and the effect of sequential SRF treatments on the impuritydistribution has not been explored. The present study analyses variousimpurities within the penetration depth of Nb samples, treated by SRF cavityprocessing techniques like colloidal silica polishing (simulating centrifugalbarrel polishing), buffer chemical polishing (BCP), high pressure rinsing (HPR)and degassing under high vacuum (HV) condition at 600{\deg}C for 10hrs. Static,dynamic and slow sputtering modes of Time of flight secondary ion massspectrometry (TOFSIMS) technique was employed to study the effect of the abovetreatments on interstitial impurities, hydrocarbons, oxides, acidic residuals,reaction products and metallic contaminations. The study confirms that theimpurity distribution in Nb is not only sensitive to the surface treatment, butalso to their sequence. Varying the treatment sequence prior to HV degassingtreatments affected the final impurity levels in HV degassed bulk Nb samples.BCP treated samples, exhibited minimum hydrocarbon and metallic contaminationbut, led to extensive contamination of the oxide layer with residuals andreaction products of acids used in BCP solution. HPR treatment, on the otherhand was effective in reducing the acidic impurities on the top surface. Thestudy also establishes the application of TOFSIMS technique to analyze andevolve SRF treatments.
机译:超导射频腔(SRF)的性能受Nb穿透深度(〜50nm)内的各种杂质的强烈影响,这又取决于所应用的表面处理。已使用各种表面分析处理方法探讨了这些表面处理方法对Nb杂质的影响。但是,该结果在许多方面仍然是不足的,并且尚未探索连续SRF处理对杂质分布的影响。本研究分析了Nb样品渗透深度范围内的各种杂质,采用胶体二氧化硅抛光(模拟离心桶抛光),缓冲化学抛光(BCP),高压冲洗(HPR)和高真空(HV)脱气等SRF腔加工技术处理在600°C下放置10小时。利用飞行时间二次离子质谱技术(TOFSIMS)的静态,动态和慢速溅射模式研究上述处理对间隙杂质,碳氢化合物,氧化物,酸性残留物,反应产物和金属污染的影响。研究证实,Nb中的杂质分布不仅对表面处理敏感,而且对它们的顺序也很敏感。在HV脱气处理之前改变处理顺序会影响HV脱气大块Nb样品中的最终杂质水平.BCP处理的样品显示出最小的碳氢化合物和金属污染,但导致氧化层被BCP溶液中残留的酸和反应产物广泛污染。另一方面,HPR处理可有效减少顶面上的酸性杂质。研究还建立了TOFSIMS技术在分析和发展SRF治疗中的应用。

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